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The Ohio State University

NanoSystems Laboratory

Diamond Chemical Vapor Deposition System (CVD)

Seki Technotron Corp. AX5200M 1.5kW Microwave-Plasma Enhanced-Chemical Vapor Deposition system

Located in PRB 1119
  1. State-of-the-art deposition tool for synthesizing high quality poly crystalline and single crystal diamond films for research and production
  2. The system is available with process gases: H2, CH4, O2 and N2
  3. Substrate heating up to 900° C
  4. Capability for biased substrate nucleation growth
Polycrystalline diamond growth:



a)-b) SEM images of polycrystalline diamond films grown at different substrate biases demonstrating control over nucleation process by controlling bias voltage. From: Dr. C. Marginean