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The Ohio State University

NanoSystems Laboratory

Maskless Aligner

Heidelberg Instruments Tabletop Maskless Aligner System µPG501

Located in the NSL clean room (PRB 0115/0117)
  1. Photo lithography for prototyping without a need for a contact mask
  2. Computer generated pattern
  3. Smallest feature size 1 µm
  4. Substrates up to 6” x 6”
  5. Address grid 50 nm x 50 nm
  6. Easy use with auto focus system
  7. Camera system for metrology and alignment
  8. High power 390 nm LED
  9. Can be used for contact mask fabrication